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Issue Date
Title
Author(s)
2006-08-17
Diffusion and activation of dopants in silicon and advanced silicon-based materials
Pichler, Peter
;
Ortiz, Christophe J
;
Colombeau, Benjamin
;
Cowern, Nicholas E B
;
Lampin, Evelyne
;
Uppal, Suresh
;
Karunaratne, M. S. A
2004-10-15
Effect of fluorine implantation dose on boron thermal diffusion in silicon
Mubarek, H A. W El
;
Bonar, J.M
;
Dilliway, G.D
;
Karunaratne, M. S. A
;
Willoughby, A. F
;
Wang, Y
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Author
2
Karunaratne, M. S. A
1
Bonar, J.M
1
Colombeau, Benjamin
1
Cowern, Nicholas E B
1
Dilliway, G.D
1
Lampin, Evelyne
1
Mubarek, H A. W El
1
Ortiz, Christophe J
1
Pichler, Peter
1
Uppal, Suresh
.
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Subject
1
activation
1
advanced silicon-based materials
1
Diffusion
1
dopants
1
fluorine implantation
1
thermal diffusion
Date issued
1
2004
1
2006
Has File(s)
2
true